Abstract: We propose a method to model the wet etch process within the Shallow Trench Isolation (STI) module in the CMOS technology. To model a process is the first step in the design of a run to run ...
Abstract: The post STI liner oxide annealing effect for 0.14μm embedded flash has been investigated. It is known that STI module is critical process for Vddmin test of logic device. To resolve Vddmin ...
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